Activation Volume for Boron Diffusion in Silicon and Implications for Strained Films
Publication information:
Y. Zhao, M. J. Aziz, H.-J. Gossmann, S. Mitha, and D. Schiferl. 1999. “Activation Volume for Boron Diffusion in Silicon and Implications for Strained Films”. Appl. Phys. Lett., 74, Pp. 31-33