Activation volume for phosphorus diffusion in silicon and Si_0.93Ge_0.07
Publication information:
Y. Zhao, M. J. Aziz, N.R. Zangenberg, and A.N. Larsen. 2005. “Activation Volume for Phosphorus Diffusion in Silicon and Si_0.93Ge_0.07”. Appl. Phys. Lett., 86, 141902